Precise Control of Fluids as Success Factor in the Semiconductor Industry
Liquid, gaseous, ultra-pure to highly aggressive fluids are used in semiconductor production. This includes ultra-pure water, liquid cooling media, but also acidic or caustic solutions such as hydrofluoric acid, sulphuric acid, hydrochloric acid or sulphuric acid and caustic soda or solvents. Precise measurement and control of the various liquid properties (e.g. temperature, flow rate, conductivity, pH value) is of central importance in semiconductor production. Other challenges include production in cleanrooms and the supply and disposal of process chemicals, bulk and speciality gases as well as other process media (e.g. compressed air, ultra-pure, process or cooling water).
Safe production processes in the cleanroom
Production in a cleanroom is challenging, as even the slightest contamination in the room air and process media can render the end product unusable. Continuous measurement and precise regulation and control of the ultra-pure media can prevent and ideally avoid contamination.
Depending on the end product (e.g. transistor, LED), it is important to customise individual process parameters (e.g. flow rate, cooling circuits) to achieve the desired properties in the product and process.
Using ultra-pure media efficiently in the process
Semiconductor production not only requires production in a cleanroom, but also the efficient handling of ultra-pure media (e.g. ultra-pure water, solvents, aggressive chemicals). Reducing the consumption of these media is generally synonymous with cost-efficient and resource-saving production. The precise control of such gases and liquids is therefore essential for modern semiconductor production. In addition, there are also legal regulations relating to the recycling and reprocessing of ultra-pure media. The efficient use of media also reduces production costs here.
Cooling in semiconductor production
A second important aspect is the specific temperature requirements that exist in the production process of semiconductor elements to be able to guarantee high and consistent product quality. Here, for example, it is important to ensure that process gases only react with the semiconductor element and not with the inner wall of the process chamber. This requires a constant gas temperature and efficient cooling of the process chamber. Such cooling systems, such as the Bürkert solution for CVD coating systems, constantly ensure the required temperature in the production process.
The same applies to controlling and maintaining the temperature of the ultra-pure water (UPW) in production, where Bürkert offers system solutions for temperature control that not only work precisely but also reliably over the entire service life of the system.
Precise and safe gas and liquid control for the subfab
The subfab is the central supply of the factory, where the preparation and post-treatment of the process media, exhaust gas cleaning and energy supply for the machines take place. All gases and liquids that the machines in the cleanroom need or no longer need for the process are controlled and monitored by the processes in the subfab. Precise fluid control in this area therefore contributes to resource-saving production overall.
Safe, customised fluid handling for the semiconductor industry
We also analyse fluidic processes, because as fluidics experts we develop solutions for your semiconductor production applications, from customised components to individually tailored systems. Here you will find a selection - discover more in a non-binding consultation.
The challenge: Residue-free removal of pollutants from the exhaust gas flow, against a backdrop of changing exhaust gas composition and throughput.
The Bürkert solution: Our system precisely controls the ratio of fuel gas to oxygen in a wide range of loads.
The challenge: Protecting the sensitive components of a pump from corrosive process gas by means of a continuous inert gas flow.
The Bürkert solution: Our gas inlet system reliably monitors and guides argon to the areas where aggressive or corrosive gases may impair or damage the pump function.
The challenge: Preventing the adhesion of particles to the wafer in the sawing process as a result of static electricity, while also optimising the pH value to avoid corrosion.
The Bürkert solution: Our system precisely doses carbon dioxide into the water used for cutting in the wafer dicing machine or process.
The challenge: Preventing deionised (DI) water from coming into contact with carbon dioxide or other impurities from the atmosphere, and a reduction in the resistance level or the exclusion of impurities.
The Bürkert solution: Our solution for automatic nitrogen dosing with optimal fill level and flow measurement prevents contamination of the DI water and also ensures that the resistance value of ultrapure water remains stable at 18.3 MΩ.cm.
The challenge: Space-saving and efficient reactor wall cooling.
The Bürkert solution: Our compact, individually tailored cooling solution ensures a consistent temperature for the reactor wall in the CVD machine.
The challenge: Space-saving and efficient cooling solution.
The Bürkert solution: Our cooling system is compact and individually tailored to suit your machine.
The challenge: Monitoring air quality, for example, with regards to air humidity and temperature for clean rooms.
The Bürkert solution: Our pneumatic valves control the water in cooling/heating circuits.
The challenge: Handling barely aggressive to highly aggressive liquids and precise dosing and analysis of process chemicals.
The Bürkert solution: Our products for conductivity, pH value and flow measurement will give you optimal results in wet etching processes. Moreover, diaphragm valves can control process liquids in your wet etching process.
Bürkert Systemhaus - Always open for fluid technology requirements in electrical and semiconductor technology
The development of reliable fluid handling solutions in the semiconductor industry is complex and time-consuming. Use the expertise of our fluidics specialists to operate more efficiently. We listen, analyse and develop pioneering products and customer-specific application solutions right through to series production. You and your projects are always welcome at the Systemhaus - on site, by telephone or virtually.
Measurably safe, measurably efficient
Suitable solutions for processes in the semiconductor industry
Modular process valve cluster – distributor and collector
- Valve cluster ready for installation
- Compact design without any potential leakage
- No assembly effort
- No piping between the valves needed
- Trusted actuators for simple automation
Mass flow controller (MFC)/mass flow meter (MFM) for gases
- Nominal flow ranges from 20 l/min up to 2500 l/min
- High accuracy and repeatability
- Communication via standard signals or Industrial Ethernet
- Electromagnetic and motor-driven valve actuation available
- Easy device exchange through configuration memory
Inductive conductivity meter, ELEMENT Design
- Perfect for concentrated liquids and wide conductivity ranges
- Pre-parameterized variants available for direct start-up
- Measuring device for direct connection to the control level (PLC) via analogue 4…20 mA signal or digital IO-Link or Bürkert system bus (büS)/CANopen communication
- Simulation of process values for diagnostics
- Variants of the sensor available in PP, PVDF or PEEK
From practice – our solutions for the semiconductor industry
Learn more about our products and solutions – or speak directly to our experts.
